@article{oai:mie-u.repo.nii.ac.jp:00004791,
 author = {Uchida, Kiyoshi and 内田, 清 and Yoshino, Seiji and 吉野, 誠司 and Masuda, Morio and 増田, 守男},
 journal = {Research reports of the Faculty of Engineering, Mie University},
 month = {Dec},
 note = {application/pdf, In the present work, the tetrode sputtering apparatus was set-up, and investigations were done on the non-uniformity of magnetic properties and other properties in GdCo amorphous films prepared with this apparatus. It was found to originate mainly from the non-uniformity of the in-plane distribution of Gd and Co atoms coming on the substrate surface which results from the aspect ratio effect and the size error of the target. The dependence of the uniaxial anisotropy on the substrate bias voltage was quite different from that reported for the rf diode sputter by other workers.},
 pages = {93--100},
 title = {Magnetic Properties of GbCo Amorphous Films Prepared by means of Tetrode Sputter},
 volume = {7},
 year = {1982}
}