{"created":"2023-06-19T11:37:28.394683+00:00","id":4791,"links":{},"metadata":{"_buckets":{"deposit":"fe3b0bad-616f-4b44-a29f-bb4550f0da53"},"_deposit":{"created_by":13,"id":"4791","owners":[13],"pid":{"revision_id":0,"type":"depid","value":"4791"},"status":"published"},"_oai":{"id":"oai:mie-u.repo.nii.ac.jp:00004791","sets":["366:367:368:375"]},"author_link":["35078","35079","35080"],"item_4_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1982-12-20","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"100","bibliographicPageStart":"93","bibliographicVolumeNumber":"7","bibliographic_titles":[{"bibliographic_title":"Research reports of the Faculty of Engineering, Mie University"}]}]},"item_4_description_14":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_4_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"In the present work, the tetrode sputtering apparatus was set-up, and investigations were done on the non-uniformity of magnetic properties and other properties in GdCo amorphous films prepared with this apparatus. It was found to originate mainly from the non-uniformity of the in-plane distribution of Gd and Co atoms coming on the substrate surface which results from the aspect ratio effect and the size error of the target. The dependence of the uniaxial anisotropy on the substrate bias voltage was quite different from that reported for the rf diode sputter by other workers.","subitem_description_type":"Abstract"}]},"item_4_publisher_30":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Faculty of Engineering, Mie University"}]},"item_4_source_id_7":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0385-6208","subitem_source_identifier_type":"PISSN"}]},"item_4_source_id_9":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA00816341","subitem_source_identifier_type":"NCID"}]},"item_4_text_18":{"attribute_name":"その他のタイトル","attribute_value_mlt":[{"subitem_text_language":"en","subitem_text_value":"4極スパッタによって製作されたGbCoアモルファス薄膜の磁気特性"}]},"item_4_text_65":{"attribute_name":"資源タイプ（三重大）","attribute_value_mlt":[{"subitem_text_value":"Departmental Bulletin Paper / 紀要論文"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Uchida, Kiyoshi","creatorNameLang":"en"},{"creatorName":"内田, 清","creatorNameLang":"ja"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Yoshino, Seiji","creatorNameLang":"en"},{"creatorName":"吉野, 誠司","creatorNameLang":"ja"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Masuda, Morio","creatorNameLang":"en"},{"creatorName":"増田, 守男","creatorNameLang":"ja"}],"nameIdentifiers":[{}]}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Magnetic Properties of GbCo Amorphous Films Prepared by means of Tetrode Sputter","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Magnetic Properties of GbCo Amorphous Films Prepared by means of Tetrode Sputter","subitem_title_language":"en"}]},"item_type_id":"4","owner":"13","path":["375"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2018-03-15"},"publish_date":"2018-03-15","publish_status":"0","recid":"4791","relation_version_is_last":true,"title":["Magnetic Properties of GbCo Amorphous Films Prepared by means of Tetrode Sputter"],"weko_creator_id":"13","weko_shared_id":-1},"updated":"2023-10-05T02:53:41.426146+00:00"}