{"created":"2023-06-19T11:39:57.302160+00:00","id":8199,"links":{},"metadata":{"_buckets":{"deposit":"8eb35313-b7b3-49d6-bedd-cf8ff6a7addf"},"_deposit":{"created_by":15,"id":"8199","owners":[15],"pid":{"revision_id":0,"type":"depid","value":"8199"},"status":"published"},"_oai":{"id":"oai:mie-u.repo.nii.ac.jp:00008199","sets":["366:638:639"]},"author_link":["20556","20557","20558","20559","20560","20561"],"item_10001_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2001-03-15","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageEnd":"6","bibliographicPageStart":"1","bibliographicVolumeNumber":"7","bibliographic_titles":[{"bibliographic_title":"Materials science research international"}]}]},"item_10001_description_19":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_10001_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"The effects of various experimental conditions on the preferred orientations of titanium nitride (TiN) thin films were investigated. These films were formed on Si (100) wafers and sapphire (0001) substrates by ion beam assisted deposition (IBAD) with various N/Ti transport ratios, N ion incidence angles, film thicknesses and substrate temperatures. The acceleration voltage of the incident ions was 1 kV. The preferred orientation of the TiN films changed from (111) to (100) as the N/Ti transport ratios and ion incidence angles increased. This phenomenon is caused by the selective damage to crystal growth due to the energy of the bombarding particles. It was also found that an increase in film thickness changed the preferred orientation of the TiN (100) film to a (100) plus (110) orientation. Furthermore, this orientation reverted to (100) with the heating of the substrate during film preparation. It is concluded that these phenomena were caused by the process of minimizing the overall energy. Thus, the heating of the substrate was useful for synthesizing thick TiN (100) films in this preparation method. Transmission electron microscopy (TEM) observation of TiN (100) films suggested that these films had good crystallinity.","subitem_description_type":"Abstract"}]},"item_10001_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Society of Materials Science"}]},"item_10001_relation_42":{"attribute_name":"関係URI","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"http://ci.nii.ac.jp/naid/110002283655/"}]}]},"item_10001_rights_15":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"社団法人日本材料学会"},{"subitem_rights":"本文データは学協会の許諾に基づきCiNiiから複製したものである"}]},"item_10001_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11046472","subitem_source_identifier_type":"NCID"}]},"item_10001_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"1341-1683","subitem_source_identifier_type":"PISSN"}]},"item_10001_subject_21":{"attribute_name":"日本十進分類法","attribute_value_mlt":[{"subitem_subject":"570","subitem_subject_scheme":"NDC"}]},"item_10001_text_70":{"attribute_name":"資源タイプ（三重大）","attribute_value_mlt":[{"subitem_text_value":"Journal Article / 学術雑誌論文"}]},"item_10001_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"MATSUMURO, Akihito","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"20556","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"HAYASHI, Toshiyuki","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"20557","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"MURAMATSU, Mutsuo","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"20558","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"TAKAHASHI, Yutaka","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"20559","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"KOHZAKI, Masao","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"20560","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"YAMAGUCHI, Katsumi","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"20561","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-02-18"}],"displaytype":"detail","filename":"40A6637.pdf","filesize":[{"value":"580.3 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"40A6637.pdf","url":"https://mie-u.repo.nii.ac.jp/record/8199/files/40A6637.pdf"},"version_id":"1cbbfc2e-7875-4cde-8295-2082947842b1"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Titanium nitride","subitem_subject_scheme":"Other"},{"subitem_subject":"Preferred orientation","subitem_subject_scheme":"Other"},{"subitem_subject":"Ion beam assisted deposition","subitem_subject_scheme":"Other"},{"subitem_subject":"Transport ratio","subitem_subject_scheme":"Other"},{"subitem_subject":"Incidence angle","subitem_subject_scheme":"Other"},{"subitem_subject":"Thickness","subitem_subject_scheme":"Other"},{"subitem_subject":"Temperature","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Variation in Preferred Orientations of TiN Thin Films Prepared by Ion Beam Assisted Deposition","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Variation in Preferred Orientations of TiN Thin Films Prepared by Ion Beam Assisted Deposition","subitem_title_language":"en"}]},"item_type_id":"10001","owner":"15","path":["639"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2008-03-05"},"publish_date":"2008-03-05","publish_status":"0","recid":"8199","relation_version_is_last":true,"title":["Variation in Preferred Orientations of TiN Thin Films Prepared by Ion Beam Assisted Deposition"],"weko_creator_id":"15","weko_shared_id":-1},"updated":"2023-10-13T02:10:29.988790+00:00"}