| Item type |
紀要論文 / Departmental Bulletin Paper(1) |
| 公開日 |
2018-03-15 |
| タイトル |
|
|
タイトル |
Magnetic Properties of Sputtered CoPt Films |
|
言語 |
en |
| 言語 |
|
|
言語 |
eng |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
CoPt alloy film |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
RF sputtering |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
resputtering |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
magnetization |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
perpendicular anisotropy |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
coercivity |
| 資源タイプ |
|
|
資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
|
資源タイプ |
departmental bulletin paper |
| アクセス権 |
|
|
アクセス権 |
metadata only access |
|
アクセス権URI |
http://purl.org/coar/access_right/c_14cb |
| 著者 |
塩見, 繁
小浦, 哲司
岡澤, 裕典
増田, 守男
|
| 抄録 |
|
|
内容記述タイプ |
Abstract |
|
内容記述 |
CoPt alloy films have been preapred by RF sputtering. Film thickness is 100nm and saturation magnetization Ms ranges from ~600 to ~1300 <special>emu/cm3</special>. In films prepared without substrate bias, the easy axis of magnetization lies in the film plane irrespective of Ms. However, perpendicular anisotropy is greatly enhanced by resputtering. In films prepared with the substrate bias of -80 V, the easy axis is perpendicular to the film plane, provided that Ms is within the range from ~800 to ~1000 <special>emu/cm3</special>. Perpendicular anisotropy in a resputtered film is greatly reduced by annealing in vacuum, while there is no significant difference between X-ray diffraction patterns before and after annealing. In films prepared without substrate bias, perpendicular coercivity is almost the same as in-plane coercivity, talking a maximum value of about 1.4 kOe when Ms≒950 <special>emu/cm3</special>. Perpendicular coercivity is hardly somewhat reduced by resputtering. |
| 書誌情報 |
Research reports of the Faculty of Engineering, Mie University
巻 15,
p. 45-48,
発行日 1990-12-20
|
| ISSN |
|
|
収録物識別子タイプ |
PISSN |
|
収録物識別子 |
0385-6208 |
| 書誌レコードID |
|
|
収録物識別子タイプ |
NCID |
|
収録物識別子 |
AA00816341 |
| フォーマット |
|
|
内容記述タイプ |
Other |
|
内容記述 |
application/pdf |
| その他のタイトル |
|
|
言語 |
ja |
|
値 |
CoPtスパッタ膜の磁気特性 |
| 出版者 |
|
|
出版者 |
Faculty of Engineering, Mie University |
| 資源タイプ（三重大） |
|
|
値 |
Departmental Bulletin Paper / 紀要論文 |
